Outliers Detection Models in Shewhart Control Charts; an Application in photolithography: A semiconductor manufacturing industry
Shewhart control charts with estimated control limits are widely used in practice. However, the estimated control limits are often affected by phase-I estimation errors. These estimation errors arise due to variation in the practitioner's choice of sample size as well as the presence of outlyin...
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| Main Authors: | , , , , |
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| Format: | Article |
| Published: |
MDPI AG
2020
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| Subjects: | |
| Online Access: | http://eprints.utm.my/id/eprint/87243/ http://dx.doi.org/10.3390/MATH8050857 |
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| Institution: | Universiti Teknologi Malaysia |