Reactive ion etching of NiFe thin films from first-principles study: A case study

Reactive ion etching of NiFe thin films from first-principles study: A case study

We propose a reactive ion etching (RIE) process design from first-principles calculations for implementation to NiFe thin-film etching. We consider the interaction between the magnetic metal surface NiFe and various gases. We found that the gases CO/NH3, or CH3OH/O 2(/NH3,H2) enable the NiFe surface...

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Main Authors: Watanabe, Susumu, Diño, Wilson Agerico, Nakanishi, Hiroshi, Kasai, Hideaki, Akinaga, Hiroyuki
Format: text
Published: Animo Repository 2005
Subjects:
Magnetic materials
Thin films
Online Access:https://animorepository.dlsu.edu.ph/faculty_research/3106
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Institution: De La Salle University
id oai:animorepository.dlsu.edu.ph:faculty_research-4098
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spelling oai:animorepository.dlsu.edu.ph:faculty_research-40982022-05-11T03:48:42Z Reactive ion etching of NiFe thin films from first-principles study: A case study Watanabe, Susumu Diño, Wilson Agerico Nakanishi, Hiroshi Kasai, Hideaki Akinaga, Hiroyuki We propose a reactive ion etching (RIE) process design from first-principles calculations for implementation to NiFe thin-film etching. We consider the interaction between the magnetic metal surface NiFe and various gases. We found that the gases CO/NH3, or CH3OH/O 2(/NH3,H2) enable the NiFe surface to be etched. © 2005 The Japan Society of Applied Physics. 2005-02-01T08:00:00Z text https://animorepository.dlsu.edu.ph/faculty_research/3106 Faculty Research Work Animo Repository Magnetic materials Thin films
institution De La Salle University
building De La Salle University Library
continent Asia
country Philippines
Philippines
content_provider De La Salle University Library
collection DLSU Institutional Repository
topic Magnetic materials
Thin films
spellingShingle Magnetic materials
Thin films
Watanabe, Susumu
Diño, Wilson Agerico
Nakanishi, Hiroshi
Kasai, Hideaki
Akinaga, Hiroyuki
Reactive ion etching of NiFe thin films from first-principles study: A case study
description We propose a reactive ion etching (RIE) process design from first-principles calculations for implementation to NiFe thin-film etching. We consider the interaction between the magnetic metal surface NiFe and various gases. We found that the gases CO/NH3, or CH3OH/O 2(/NH3,H2) enable the NiFe surface to be etched. © 2005 The Japan Society of Applied Physics.
format text
author Watanabe, Susumu
Diño, Wilson Agerico
Nakanishi, Hiroshi
Kasai, Hideaki
Akinaga, Hiroyuki
author_facet Watanabe, Susumu
Diño, Wilson Agerico
Nakanishi, Hiroshi
Kasai, Hideaki
Akinaga, Hiroyuki
author_sort Watanabe, Susumu
title Reactive ion etching of NiFe thin films from first-principles study: A case study
title_short Reactive ion etching of NiFe thin films from first-principles study: A case study
title_full Reactive ion etching of NiFe thin films from first-principles study: A case study
title_fullStr Reactive ion etching of NiFe thin films from first-principles study: A case study
title_full_unstemmed Reactive ion etching of NiFe thin films from first-principles study: A case study
title_sort reactive ion etching of nife thin films from first-principles study: a case study
publisher Animo Repository
publishDate 2005
url https://animorepository.dlsu.edu.ph/faculty_research/3106
_version_ 1733052804155572224

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