Reactive ion etching of NiFe thin films from first-principles study: A case study
We propose a reactive ion etching (RIE) process design from first-principles calculations for implementation to NiFe thin-film etching. We consider the interaction between the magnetic metal surface NiFe and various gases. We found that the gases CO/NH3, or CH3OH/O 2(/NH3,H2) enable the NiFe surface...
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Main Authors: | Watanabe, Susumu, Diño, Wilson Agerico, Nakanishi, Hiroshi, Kasai, Hideaki, Akinaga, Hiroyuki |
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Format: | text |
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Animo Repository
2005
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Online Access: | https://animorepository.dlsu.edu.ph/faculty_research/3106 |
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Institution: | De La Salle University |
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