Design of reactive ion etching process based on ab-initio calculation - The first step-

• Main Authors: Matsumoto, Shigeno, Diño, Wilson A., David, Melanie Y., Muhida, Rifki, Roman, Tanglaw A., Kunikata, Shinichi, Takano, Fumiyoshi, Akinaga, Hiro, Kasai, Hideaki
• Format: text
• Published: Animo Repository 2007
• Subjects: Plasma etching; Transition metals
• Online Access: https://animorepository.dlsu.edu.ph/faculty_research/4564
• Institution: De La Salle University

We propose an intricate method of Reactive Ion Etching (RIE) process design for transition-metal (TM) materials using ab-initio calculations. The TM materials are inert in dry etching processes since volatile etching by-products cannot be formed easily. However, to achieve new high-performance memor...