Analysis of perovskite oxide etching using argon inductively coupled plasmas for photonics applications

Analysis of perovskite oxide etching using argon inductively coupled plasmas for photonics applications

10.1186/s11671-021-03494-2

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Bibliographic Details
Main Authors: Guanyu Chen, Eric Jun Hao Cheung, Yu Cao, Jisheng Pan, Aaron J. Danner
Other Authors: ELECTRICAL AND COMPUTER ENGINEERING
Format: Article
Published: SpringerOpen 2021
Subjects:
Perovskite oxide
Argon
Inductively coupled plasma etching
Photonics
Online Access:https://scholarbank.nus.edu.sg/handle/10635/188021
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Institution: National University of Singapore

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https://scholarbank.nus.edu.sg/handle/10635/188021

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