Reactive ion etching of NiFe thin films from first-principles study: A case study

• المؤلفون الرئيسيون: Watanabe, Susumu, Diño, Wilson Agerico, Nakanishi, Hiroshi, Kasai, Hideaki, Akinaga, Hiroyuki
• التنسيق: text
• منشور في: Animo Repository 2005
• الموضوعات: Magnetic materials; Thin films
• الوصول للمادة أونلاين: https://animorepository.dlsu.edu.ph/faculty_research/3106
• المؤسسة: De La Salle University

We propose a reactive ion etching (RIE) process design from first-principles calculations for implementation to NiFe thin-film etching. We consider the interaction between the magnetic metal surface NiFe and various gases. We found that the gases CO/NH3, or CH3OH/O 2(/NH3,H2) enable the NiFe surface...