Reactive ion etching of NiFe thin films from first-principles study: A case study
We propose a reactive ion etching (RIE) process design from first-principles calculations for implementation to NiFe thin-film etching. We consider the interaction between the magnetic metal surface NiFe and various gases. We found that the gases CO/NH3, or CH3OH/O 2(/NH3,H2) enable the NiFe surface...
Saved in:
Main Authors: | , , , , |
---|---|
格式: | text |
出版: |
Animo Repository
2005
|
主題: | |
在線閱讀: | https://animorepository.dlsu.edu.ph/faculty_research/3106 |
標簽: |
添加標簽
沒有標簽, 成為第一個標記此記錄!
|