A deformable annular slit for generating elliptical Bessel beams

Photolithography is used to fabricate an annular slit on an elastomeric substrate. The shape of the aperture is altered through the application of unidirectional mechanical strain. With an unmodified annular slit, standard Bessel beams with circular intensity distributions are obtained over a propag...

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Main Authors: Guaña, Dominic P, Guerrero, Raphael A
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出版: Archīum Ateneo 2019
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在線閱讀:https://archium.ateneo.edu/physics-faculty-pubs/8
https://iopscience.iop.org/article/10.7567/1347-4065/ab159c/meta
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機構: Ateneo De Manila University