OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps

We report a simple and highly efficient method for creating graphene nanostructures with gaps that can be controlled on the sub-10 nm length scale by utilizing etch masks comprised of electrochemically synthesized multisegmented metal nanowires. This method involves depositing striped nanowires with...

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Main Authors: Zhou, Xiaozhu, Shade, Chad M., Schmucker, Abrin L., Brown, Keith A., He, Shu, Boey, Freddy Yin Chiang, Ma, Jan, Zhang, Hua, Mirkin, Chad A.
Other Authors: School of Materials Science & Engineering
Format: Article
Language:English
Published: 2013
Online Access:https://hdl.handle.net/10356/101437
http://hdl.handle.net/10220/11110
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-1014372020-06-01T10:21:15Z OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps Zhou, Xiaozhu Shade, Chad M. Schmucker, Abrin L. Brown, Keith A. He, Shu Boey, Freddy Yin Chiang Ma, Jan Zhang, Hua Mirkin, Chad A. School of Materials Science & Engineering We report a simple and highly efficient method for creating graphene nanostructures with gaps that can be controlled on the sub-10 nm length scale by utilizing etch masks comprised of electrochemically synthesized multisegmented metal nanowires. This method involves depositing striped nanowires with Au and Ni segments on a graphene-coated substrate, chemically etching the Ni segments, and using a reactive ion etch to remove the graphene not protected by the remaining Au segments. Graphene nanoribbons with gaps as small as 6 nm are fabricated and characterized with atomic force microscopy, scanning electron microscopy, and Raman spectroscopy. The high level of control afforded by electrochemical synthesis of the nanowires allows us to specify the dimensions of the nanoribbon, as well as the number, location, and size of nanogaps within the nanoribbon. In addition, the generality of this technique is demonstrated by creating silicon nanostructures with nanogaps. 2013-07-10T06:31:59Z 2019-12-06T20:38:44Z 2013-07-10T06:31:59Z 2019-12-06T20:38:44Z 2012 2012 Journal Article Zhou, X., Shade, C. M., Schmucker, A. L., Brown, K. A., He, S., Boey, F., et al. (2012). OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps. Nano Letters, 12(9), 4734-4737. https://hdl.handle.net/10356/101437 http://hdl.handle.net/10220/11110 10.1021/nl302171z en Nano letters © 2012 American Chemical Society.
institution Nanyang Technological University
building NTU Library
country Singapore
collection DR-NTU
language English
description We report a simple and highly efficient method for creating graphene nanostructures with gaps that can be controlled on the sub-10 nm length scale by utilizing etch masks comprised of electrochemically synthesized multisegmented metal nanowires. This method involves depositing striped nanowires with Au and Ni segments on a graphene-coated substrate, chemically etching the Ni segments, and using a reactive ion etch to remove the graphene not protected by the remaining Au segments. Graphene nanoribbons with gaps as small as 6 nm are fabricated and characterized with atomic force microscopy, scanning electron microscopy, and Raman spectroscopy. The high level of control afforded by electrochemical synthesis of the nanowires allows us to specify the dimensions of the nanoribbon, as well as the number, location, and size of nanogaps within the nanoribbon. In addition, the generality of this technique is demonstrated by creating silicon nanostructures with nanogaps.
author2 School of Materials Science & Engineering
author_facet School of Materials Science & Engineering
Zhou, Xiaozhu
Shade, Chad M.
Schmucker, Abrin L.
Brown, Keith A.
He, Shu
Boey, Freddy Yin Chiang
Ma, Jan
Zhang, Hua
Mirkin, Chad A.
format Article
author Zhou, Xiaozhu
Shade, Chad M.
Schmucker, Abrin L.
Brown, Keith A.
He, Shu
Boey, Freddy Yin Chiang
Ma, Jan
Zhang, Hua
Mirkin, Chad A.
spellingShingle Zhou, Xiaozhu
Shade, Chad M.
Schmucker, Abrin L.
Brown, Keith A.
He, Shu
Boey, Freddy Yin Chiang
Ma, Jan
Zhang, Hua
Mirkin, Chad A.
OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps
author_sort Zhou, Xiaozhu
title OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps
title_short OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps
title_full OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps
title_fullStr OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps
title_full_unstemmed OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps
title_sort owl-based nanomasks for preparing graphene ribbons with sub-10 nm gaps
publishDate 2013
url https://hdl.handle.net/10356/101437
http://hdl.handle.net/10220/11110
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