OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps

• Main Authors: Zhou, Xiaozhu, Shade, Chad M., Schmucker, Abrin L., Brown, Keith A., He, Shu, Boey, Freddy Yin Chiang, Ma, Jan, Zhang, Hua, Mirkin, Chad A.
• Other Authors: School of Materials Science & Engineering
• Format: Article
• Language: English
• Published: 2013
• Online Access: https://hdl.handle.net/10356/101437; http://hdl.handle.net/10220/11110
• Institution: Nanyang Technological University

We report a simple and highly efficient method for creating graphene nanostructures with gaps that can be controlled on the sub-10 nm length scale by utilizing etch masks comprised of electrochemically synthesized multisegmented metal nanowires. This method involves depositing striped nanowires with...