Layer thinning and etching of mechanically exfoliated MoS2 nanosheets by thermal annealing in air

• Main Authors: Wu, Jumiati, Li, Hai, Yin, Zongyou, Li, Hong, Liu, Juqing, Cao, Xiehong, Zhang, Qing, Zhang, Hua
• Other Authors: School of Electrical and Electronic Engineering
• Format: Article
• Language: English
• Published: 2014
• Subjects: DRNTU::Engineering::Electrical and electronic engineering
• Online Access: https://hdl.handle.net/10356/102277; http://hdl.handle.net/10220/19027
• Institution: Nanyang Technological University

A simple thermal annealing method for layer thinning and etching of mechanically exfoliated MoS2 nanosheets in air is reported. Using this method, single-layer (1L) MoS2 nanosheets are achieved after the thinning of MoS2 nanosheets from double-layer (2L) to quadri-layer (4L) at 330 °C. The as-prepar...