Conduction mechanisms on high retention annealed mgo-based resistive switching memory devices

We report on the conduction mechanisms of novel Ru/MgO/Cu and Ru/MgO/Ta resistive switching memory (RSM) devices. Current-voltage (I–V) measurements revealed Schottky emission (SE) as the dominant conduction mechanism in the high resistance state (HRS), which was validated by varying temperatures an...

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Main Authors: Loy, Desmond Jia Jun, Dananjaya, Putu Andhita, Hong, Xiao Liang, Shum, D. P., Lew, Wensiang
Other Authors: School of Physical and Mathematical Sciences
Format: Article
Language:English
Published: 2019
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Online Access:https://hdl.handle.net/10356/103404
http://hdl.handle.net/10220/47306
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Institution: Nanyang Technological University
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spelling sg-ntu-dr.10356-1034042023-02-28T19:44:01Z Conduction mechanisms on high retention annealed mgo-based resistive switching memory devices Loy, Desmond Jia Jun Dananjaya, Putu Andhita Hong, Xiao Liang Shum, D. P. Lew, Wensiang School of Physical and Mathematical Sciences Conduction Mechanisms Schottky Emission DRNTU::Science::Chemistry We report on the conduction mechanisms of novel Ru/MgO/Cu and Ru/MgO/Ta resistive switching memory (RSM) devices. Current-voltage (I–V) measurements revealed Schottky emission (SE) as the dominant conduction mechanism in the high resistance state (HRS), which was validated by varying temperatures and transmission electron microscopy (TEM) results. Retention of more than 10 years at 85 °C was obtained for both Ru/MgO/Ta and Ru/MgO/Cu RSM devices. In addition, annealing processes greatly improved the consistency of HRS and LRS switching paths from cycle to cycle, exhibiting an average ON/OFF ratio of 102. Further TEM studies also highlighted the difference in crystallinity between different materials in Ru/MgO/Cu RSM devices, confirming Cu filament identification which was found to be 10 nm in width. Published version 2019-01-02T06:29:06Z 2019-12-06T21:11:55Z 2019-01-02T06:29:06Z 2019-12-06T21:11:55Z 2018 Journal Article Loy, D. J. J., Dananjaya, P. A., Hong, X. L., Shum, D. P., & Lew, W. S. (2018). Conduction Mechanisms on High Retention Annealed MgO-based Resistive Switching Memory Devices. Scientific Reports, 8(1), 14774-. doi:10.1038/s41598-018-33198-0 https://hdl.handle.net/10356/103404 http://hdl.handle.net/10220/47306 10.1038/s41598-018-33198-0 en Scientific Reports © 2018 The Author(s). This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/. 9 p. application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic Conduction Mechanisms
Schottky Emission
DRNTU::Science::Chemistry
spellingShingle Conduction Mechanisms
Schottky Emission
DRNTU::Science::Chemistry
Loy, Desmond Jia Jun
Dananjaya, Putu Andhita
Hong, Xiao Liang
Shum, D. P.
Lew, Wensiang
Conduction mechanisms on high retention annealed mgo-based resistive switching memory devices
description We report on the conduction mechanisms of novel Ru/MgO/Cu and Ru/MgO/Ta resistive switching memory (RSM) devices. Current-voltage (I–V) measurements revealed Schottky emission (SE) as the dominant conduction mechanism in the high resistance state (HRS), which was validated by varying temperatures and transmission electron microscopy (TEM) results. Retention of more than 10 years at 85 °C was obtained for both Ru/MgO/Ta and Ru/MgO/Cu RSM devices. In addition, annealing processes greatly improved the consistency of HRS and LRS switching paths from cycle to cycle, exhibiting an average ON/OFF ratio of 102. Further TEM studies also highlighted the difference in crystallinity between different materials in Ru/MgO/Cu RSM devices, confirming Cu filament identification which was found to be 10 nm in width.
author2 School of Physical and Mathematical Sciences
author_facet School of Physical and Mathematical Sciences
Loy, Desmond Jia Jun
Dananjaya, Putu Andhita
Hong, Xiao Liang
Shum, D. P.
Lew, Wensiang
format Article
author Loy, Desmond Jia Jun
Dananjaya, Putu Andhita
Hong, Xiao Liang
Shum, D. P.
Lew, Wensiang
author_sort Loy, Desmond Jia Jun
title Conduction mechanisms on high retention annealed mgo-based resistive switching memory devices
title_short Conduction mechanisms on high retention annealed mgo-based resistive switching memory devices
title_full Conduction mechanisms on high retention annealed mgo-based resistive switching memory devices
title_fullStr Conduction mechanisms on high retention annealed mgo-based resistive switching memory devices
title_full_unstemmed Conduction mechanisms on high retention annealed mgo-based resistive switching memory devices
title_sort conduction mechanisms on high retention annealed mgo-based resistive switching memory devices
publishDate 2019
url https://hdl.handle.net/10356/103404
http://hdl.handle.net/10220/47306
_version_ 1759853168891527168