Enhancement in the performance of ultrathin hematite photoanode for water splitting by an oxide underlayer

Enhancement in the performance of ultrathin hematite photoanode for water splitting by an oxide underlayer

A 2-nm thick Nb2O5 underlayer deposited by atomic layer deposition increases the charge separation efficiency and the photovoltage of ultrathin hematite films by suppressing electron back injection. Absorbed photon-to-current efficiencies (APCE) as high as 40%, which are one of the highest ever repo...

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Bibliographic Details
Main Authors: Grätzel, Michael, Hisatomi, Takashi, Dotan, Hen, Stefik, Morgan, Sivula, Kevin, Rothschild, Avner, Mathews, Nripan
Other Authors: School of Materials Science & Engineering
Format: Article
Language:English
Published: 2013
Online Access:https://hdl.handle.net/10356/106608
http://hdl.handle.net/10220/10667
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Institution: Nanyang Technological University
Language: English
Description
Summary:A 2-nm thick Nb2O5 underlayer deposited by atomic layer deposition increases the charge separation efficiency and the photovoltage of ultrathin hematite films by suppressing electron back injection. Absorbed photon-to-current efficiencies (APCE) as high as 40%, which are one of the highest ever reported with hematite photoanodes, are obtained at 400 nm at +1.43 V vs. RHE.

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