Enhancement in the performance of ultrathin hematite photoanode for water splitting by an oxide underlayer
A 2-nm thick Nb2O5 underlayer deposited by atomic layer deposition increases the charge separation efficiency and the photovoltage of ultrathin hematite films by suppressing electron back injection. Absorbed photon-to-current efficiencies (APCE) as high as 40%, which are one of the highest ever repo...
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2013
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sg-ntu-dr.10356-1066082021-01-08T07:06:40Z Enhancement in the performance of ultrathin hematite photoanode for water splitting by an oxide underlayer Grätzel, Michael Hisatomi, Takashi Dotan, Hen Stefik, Morgan Sivula, Kevin Rothschild, Avner Mathews, Nripan School of Materials Science & Engineering Energy Research Institute @ NTU (ERI@N) A 2-nm thick Nb2O5 underlayer deposited by atomic layer deposition increases the charge separation efficiency and the photovoltage of ultrathin hematite films by suppressing electron back injection. Absorbed photon-to-current efficiencies (APCE) as high as 40%, which are one of the highest ever reported with hematite photoanodes, are obtained at 400 nm at +1.43 V vs. RHE. 2013-06-25T08:11:53Z 2019-12-06T22:14:53Z 2013-06-25T08:11:53Z 2019-12-06T22:14:53Z 2012 2012 Journal Article Hisatomi, T., Dotan, H., Stefik, M., Sivula, K., Rothschild, A., Grätzel, M., et al. (2012). Enhancement in the Performance of Ultrathin Hematite Photoanode for Water Splitting by an Oxide Underlayer. Advanced Materials, 24(20), 2699-2702. 0935-9648 https://hdl.handle.net/10356/106608 http://hdl.handle.net/10220/10667 10.1002/adma.201104868 en Advanced materials © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. |
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A 2-nm thick Nb2O5 underlayer deposited by atomic layer deposition increases the charge separation efficiency and the photovoltage of ultrathin hematite films by suppressing electron back injection. Absorbed photon-to-current efficiencies (APCE) as high as 40%, which are one of the highest ever reported with hematite photoanodes, are obtained at 400 nm at +1.43 V vs. RHE. |
| author2 |
School of Materials Science & Engineering |
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School of Materials Science & Engineering Grätzel, Michael Hisatomi, Takashi Dotan, Hen Stefik, Morgan Sivula, Kevin Rothschild, Avner Mathews, Nripan |
| format |
Article |
| author |
Grätzel, Michael Hisatomi, Takashi Dotan, Hen Stefik, Morgan Sivula, Kevin Rothschild, Avner Mathews, Nripan |
| spellingShingle |
Grätzel, Michael Hisatomi, Takashi Dotan, Hen Stefik, Morgan Sivula, Kevin Rothschild, Avner Mathews, Nripan Enhancement in the performance of ultrathin hematite photoanode for water splitting by an oxide underlayer |
| author_sort |
Grätzel, Michael |
| title |
Enhancement in the performance of ultrathin hematite photoanode for water splitting by an oxide underlayer |
| title_short |
Enhancement in the performance of ultrathin hematite photoanode for water splitting by an oxide underlayer |
| title_full |
Enhancement in the performance of ultrathin hematite photoanode for water splitting by an oxide underlayer |
| title_fullStr |
Enhancement in the performance of ultrathin hematite photoanode for water splitting by an oxide underlayer |
| title_full_unstemmed |
Enhancement in the performance of ultrathin hematite photoanode for water splitting by an oxide underlayer |
| title_sort |
enhancement in the performance of ultrathin hematite photoanode for water splitting by an oxide underlayer |
| publishDate |
2013 |
| url |
https://hdl.handle.net/10356/106608 http://hdl.handle.net/10220/10667 |
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1688665532577873920 |