Near-field assisted nanoscale patterning for improved absorption in thin film silicon solar cell

Near field optics concepts have introduced a paradigm shift in a wide variety of engineering fields in the recent past and the most significant applications of this fundamental physics concepts have been in the applied engineering problems such as improved broad band light absorption thereby enhanci...

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Main Authors: Murukeshan, V. M., Prabhathan, P., Sidharthan, R.
Other Authors: Reutzel, Edward W.
Format: Conference or Workshop Item
Language:English
Published: 2015
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Online Access:https://hdl.handle.net/10356/106935
http://hdl.handle.net/10220/25201
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-1069352023-03-04T17:07:41Z Near-field assisted nanoscale patterning for improved absorption in thin film silicon solar cell Murukeshan, V. M. Prabhathan, P. Sidharthan, R. Reutzel, Edward W. School of Mechanical and Aerospace Engineering Laser Processing and Fabrication for Solar, Displays, and Optoelectronic Devices III Centre for Optical and Laser Engineering DRNTU::Engineering::Mechanical engineering::Kinematics and dynamics of machinery Near field optics concepts have introduced a paradigm shift in a wide variety of engineering fields in the recent past and the most significant applications of this fundamental physics concepts have been in the applied engineering problems such as improved broad band light absorption thereby enhancing the conversion efficiency of thin silicon solar cells. Also, for writing patterned structures or features using non contact optical methodologies have enabled near field optics assisted fabrication and related applications. The technology involving optics concepts and methodologies targeting energy sector have seen the impact of the same with a challenging trend to achieve smaller features or devices with micro- or nano-scale features. This demands automatically the need for achieving much smaller features beyond the forecasted sub- 30nm feature patterning methodologies. To meet such demands, a new branch of near- field optical concepts for improving patterning resolution has started developing which have been receiving considerable attention for its ability to produce high density sub-wavelength features that can find tremendous energy harvesting applications. This paper in this context mainly focuses on the review of different near field optical concepts and approaches developed for patterning by the author’s group at NTU. Different concepts were explored incorporating surface Plasmon waves ( LSPs, SPPs, LRSPs), gap modes as well as their interference in order to high resolution features and pattern dimensions at nano-scales. The absorbance of near band gap light is small and hence structuring of thin film solar cell is very important for increasing the absorbance by light trapping. The manuscript conclude by correlating the above said aspects and the challenges in achieving improved light conversion in thin film solar cells. Published version 2015-03-09T06:24:30Z 2019-12-06T22:21:25Z 2015-03-09T06:24:30Z 2019-12-06T22:21:25Z 2014 2014 Conference Paper Murukeshan, V. M., Prabhathan, P., & Sidharthan, R. (2014). Near-field assisted nanoscale patterning for improved absorption in thin film silicon solar cell. Proceedings of SPIE- Laser Processing and Fabrication for Solar, Displays, and Optoelectronic Devices III, 9180, 91800A-. https://hdl.handle.net/10356/106935 http://hdl.handle.net/10220/25201 10.1117/12.2069667 en © 2014 Society of Photo-Optical Instrumentation Engineers (SPIE). This paper was published in Proceedings of SPIE- Laser Processing and Fabrication for Solar, Displays, and Optoelectronic Devices III and is made available as an electronic reprint (preprint) with permission of Society of Photo-Optical Instrumentation Engineers (SPIE). The paper can be found at the following official DOI: [http://dx.doi.org/10.1117/12.2069667].  One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law. 7 p. application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic DRNTU::Engineering::Mechanical engineering::Kinematics and dynamics of machinery
spellingShingle DRNTU::Engineering::Mechanical engineering::Kinematics and dynamics of machinery
Murukeshan, V. M.
Prabhathan, P.
Sidharthan, R.
Near-field assisted nanoscale patterning for improved absorption in thin film silicon solar cell
description Near field optics concepts have introduced a paradigm shift in a wide variety of engineering fields in the recent past and the most significant applications of this fundamental physics concepts have been in the applied engineering problems such as improved broad band light absorption thereby enhancing the conversion efficiency of thin silicon solar cells. Also, for writing patterned structures or features using non contact optical methodologies have enabled near field optics assisted fabrication and related applications. The technology involving optics concepts and methodologies targeting energy sector have seen the impact of the same with a challenging trend to achieve smaller features or devices with micro- or nano-scale features. This demands automatically the need for achieving much smaller features beyond the forecasted sub- 30nm feature patterning methodologies. To meet such demands, a new branch of near- field optical concepts for improving patterning resolution has started developing which have been receiving considerable attention for its ability to produce high density sub-wavelength features that can find tremendous energy harvesting applications. This paper in this context mainly focuses on the review of different near field optical concepts and approaches developed for patterning by the author’s group at NTU. Different concepts were explored incorporating surface Plasmon waves ( LSPs, SPPs, LRSPs), gap modes as well as their interference in order to high resolution features and pattern dimensions at nano-scales. The absorbance of near band gap light is small and hence structuring of thin film solar cell is very important for increasing the absorbance by light trapping. The manuscript conclude by correlating the above said aspects and the challenges in achieving improved light conversion in thin film solar cells.
author2 Reutzel, Edward W.
author_facet Reutzel, Edward W.
Murukeshan, V. M.
Prabhathan, P.
Sidharthan, R.
format Conference or Workshop Item
author Murukeshan, V. M.
Prabhathan, P.
Sidharthan, R.
author_sort Murukeshan, V. M.
title Near-field assisted nanoscale patterning for improved absorption in thin film silicon solar cell
title_short Near-field assisted nanoscale patterning for improved absorption in thin film silicon solar cell
title_full Near-field assisted nanoscale patterning for improved absorption in thin film silicon solar cell
title_fullStr Near-field assisted nanoscale patterning for improved absorption in thin film silicon solar cell
title_full_unstemmed Near-field assisted nanoscale patterning for improved absorption in thin film silicon solar cell
title_sort near-field assisted nanoscale patterning for improved absorption in thin film silicon solar cell
publishDate 2015
url https://hdl.handle.net/10356/106935
http://hdl.handle.net/10220/25201
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