Study of indium gallium phosphide compound semiconductor grown by solid source molecular beam epitaxy

This thesis presents the molecular beam epitaxial (MBE) growth of In0.48Ga0.52P epilayers on GaAs substrate (001) using the valved phosphorus cracker cell at various growth conditions. Results from crystalline quality, optical, transport and surface morphology characterizations of the material syste...

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Bibliographic Details
Main Author: Mah, Kia Woon
Other Authors: Yoon, Soon Fatt
Format: Theses and Dissertations
Language:English
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/10356/13321
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Institution: Nanyang Technological University
Language: English
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