Two-photon-assisted polymerization and reduction : emerging formulations and applications

Two-photon-assisted polymerization and reduction : emerging formulations and applications

Two-photon lithography (TPL) is an emerging approach to fabricate complex multifunctional micro/nanostructures. This is because TPL can easily develop various 2D and 3D structures on a variety of surfaces, and there has been a rapidly expanding pool of processable photoresists to create different ma...

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Bibliographic Details
Main Authors: Lay, Chee Leng, Koh, Charlynn Sher Lin, Lee, Yih Hong, Phan-Quang, Gia Chuong, Sim, Howard Yi Fan, Leong, Shi Xuan, Han, Xuemei, Phang, In Yee, Ling, Xing Yi
Other Authors: School of Physical and Mathematical Sciences
Format: Article
Language:English
Published: 2020
Subjects:
Science::Physics
Two-photon Lithography
Two-photon Polymerization
Online Access:https://hdl.handle.net/10356/143426
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Institution: Nanyang Technological University
Language: English

Internet

https://hdl.handle.net/10356/143426

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