Two-photon-assisted polymerization and reduction : emerging formulations and applications
Two-photon lithography (TPL) is an emerging approach to fabricate complex multifunctional micro/nanostructures. This is because TPL can easily develop various 2D and 3D structures on a variety of surfaces, and there has been a rapidly expanding pool of processable photoresists to create different ma...
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Main Authors: | Lay, Chee Leng, Koh, Charlynn Sher Lin, Lee, Yih Hong, Phan-Quang, Gia Chuong, Sim, Howard Yi Fan, Leong, Shi Xuan, Han, Xuemei, Phang, In Yee, Ling, Xing Yi |
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Other Authors: | School of Physical and Mathematical Sciences |
Format: | Article |
Language: | English |
Published: |
2020
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Subjects: | |
Online Access: | https://hdl.handle.net/10356/143426 |
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Institution: | Nanyang Technological University |
Language: | English |
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