Two-photon-assisted polymerization and reduction : emerging formulations and applications

Two-photon-assisted polymerization and reduction : emerging formulations and applications

Two-photon lithography (TPL) is an emerging approach to fabricate complex multifunctional micro/nanostructures. This is because TPL can easily develop various 2D and 3D structures on a variety of surfaces, and there has been a rapidly expanding pool of processable photoresists to create different ma...

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書目詳細資料
Main Authors:	Lay, Chee Leng, Koh, Charlynn Sher Lin, Lee, Yih Hong, Phan-Quang, Gia Chuong, Sim, Howard Yi Fan, Leong, Shi Xuan, Han, Xuemei, Phang, In Yee, Ling, Xing Yi
其他作者:	School of Physical and Mathematical Sciences
格式:	Article
語言:	English
出版:	2020
主題:	Science::Physics Two-photon Lithography Two-photon Polymerization
在線閱讀:	https://hdl.handle.net/10356/143426
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!
機構:	Nanyang Technological University
語言:	English

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