Two-photon-assisted polymerization and reduction : emerging formulations and applications

• المؤلفون الرئيسيون: Lay, Chee Leng, Koh, Charlynn Sher Lin, Lee, Yih Hong, Phan-Quang, Gia Chuong, Sim, Howard Yi Fan, Leong, Shi Xuan, Han, Xuemei, Phang, In Yee, Ling, Xing Yi
• مؤلفون آخرون: School of Physical and Mathematical Sciences
• التنسيق: مقال
• اللغة: English
• منشور في: 2020
• الموضوعات: Science::Physics; Two-photon Lithography; Two-photon Polymerization
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/143426
• المؤسسة: Nanyang Technological University

Two-photon lithography (TPL) is an emerging approach to fabricate complex multifunctional micro/nanostructures. This is because TPL can easily develop various 2D and 3D structures on a variety of surfaces, and there has been a rapidly expanding pool of processable photoresists to create different ma...