Non-diffraction beam for small hotspot in lithography
Improving the resolution of lithography so that more electronic components can be integrated on a smaller chip is what we always strive for. At present, the high resolution photolithography machine in the market is mainly EUV, but only ASML can make it at present, and it has a very high requirement...
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| Format: | Thesis-Master by Coursework |
| Language: | English |
| Published: |
Nanyang Technological University
2021
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| Online Access: | https://hdl.handle.net/10356/151185 |
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| Institution: | Nanyang Technological University |
| Language: | English |