Effect of titanium doping on conductivity, density of states and conduction mechanism in ZnO thin film

High quality, ~ 120 nm thin ZnO and Ti-doped ZnO (TZO) films were deposited on silicon substrates using magnetron co-sputtering technique. Surface roughness of the films was ~ 2 nm. Ti incorporation effect on the structure, morphology, conductivity, density of states (DOS) and conduction mechanism w...

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Bibliographic Details
Main Authors: Jamil, Arifa, Sajid Fareed, Tiwari, Naveen, Li, Chuanbo, Cheng, Buwen, Xu, Xiulai, Muhammad Aftab Rafiq
Other Authors: School of Materials Science and Engineering
Format: Article
Language:English
Published: 2021
Subjects:
Online Access:https://hdl.handle.net/10356/151629
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Institution: Nanyang Technological University
Language: English