Electromagnetic ray tracing model for line structures and characterization of advanced alignment marks in photolithography

• Main Author: Tan, Chin Boon
• Other Authors: Yeo Swee Hock
• Format: Theses and Dissertations
• Language: English
• Published: 2009
• Subjects: DRNTU::Engineering::Manufacturing; DRNTU::Engineering::Electrical and electronic engineering::Semiconductors; DRNTU::Science::Mathematics::Applied mathematics::Simulation and modeling
• Online Access: https://hdl.handle.net/10356/15168
• Institution: Nanyang Technological University

Line structures are an essential part in integrated circuit (IC) fabrication. In photolithography, the electromagnetic scattering of line structures is one of the main factors that determine the advancement of the technology node. From the perspective of modeling, a theoretical model to physically...