Electromagnetic ray tracing model for line structures and characterization of advanced alignment marks in photolithography

• المؤلف الرئيسي: Tan, Chin Boon
• مؤلفون آخرون: Yeo Swee Hock
• التنسيق: Theses and Dissertations
• اللغة: English
• منشور في: 2009
• الموضوعات: DRNTU::Engineering::Manufacturing; DRNTU::Engineering::Electrical and electronic engineering::Semiconductors; DRNTU::Science::Mathematics::Applied mathematics::Simulation and modeling
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/15168
• المؤسسة: Nanyang Technological University

Line structures are an essential part in integrated circuit (IC) fabrication. In photolithography, the electromagnetic scattering of line structures is one of the main factors that determine the advancement of the technology node. From the perspective of modeling, a theoretical model to physically...