Electromagnetic ray tracing model for line structures and characterization of advanced alignment marks in photolithography
Line structures are an essential part in integrated circuit (IC) fabrication. In photolithography, the electromagnetic scattering of line structures is one of the main factors that determine the advancement of the technology node. From the perspective of modeling, a theoretical model to physically...
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| Format: | Theses and Dissertations |
| Language: | English |
| Published: |
2009
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| Online Access: | https://hdl.handle.net/10356/15168 |
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| Institution: | Nanyang Technological University |
| Language: | English |