Deposited poly-Si as on-demand linewidth compensator for on-chip Fabry-Perot interferometer and vertical linear variable optical filter bandpass and passband manipulation

• Main Authors: Goh, Simon Chun Kiat, Chen, Nan, Shiau, Li Lynn, Tay, Beng Kang, Lee, ChengKuo, Tan, Chuan Seng
• Other Authors: School of Electrical and Electronic Engineering
• Format: Article
• Language: English
• Published: 2021
• Subjects: Engineering::Electrical and electronic engineering; Low-Velocity Oxyfuel; Si-air
• Online Access: https://hdl.handle.net/10356/152182
• Institution: Nanyang Technological University

Deep reactive ion etching (DRIE) is an important process for etching vertical structures for microelectromechanical systems. Due to the sidewall profile of some photoresists as well as effects from upstream processes, bulk micromachined structures, to a certain extent, could differ from expected. Co...