Producing microscale Ge textures via titanium nitride- and nickel-assisted chemical etching with CMOS-compatibiliyty

• Main Authors: Liao, Yikai, Shin, Sang-Ho, Jin, Yuhao, Wang, Qi Jie, Kim, Munho
• Other Authors: School of Electrical and Electronic Engineering
• Format: Article
• Language: English
• Published: 2022
• Subjects: Engineering::Electrical and electronic engineering; Anti-Reflection Surface Textures; Germanium
• Online Access: https://hdl.handle.net/10356/156889
• Institution: Nanyang Technological University

As an emerging anisotropic wet etching technique, metal-assisted chemical etching (MacEtch) has been widely employed for fabricating nano- and micro-structures of germanium (Ge) for potential infrared (IR) photonics and optoelectronics. However, traditional noble metal catalysts such as Au and Ag li...