Large-scale Huygens' metasurfaces for holographic 3D near-eye displays

Novel display technologies aim at providing the users with increasingly immersive experiences. In this regard, it is a long-sought dream to generate three-dimensional (3D) scenes with high resolution and continuous depth, which can be overlaid with the real world. Current attempts to do so, howev...

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Bibliographic Details
Main Authors: Song, Weitao, Liang, Xinan, Li, Shiqiang, Li, Dongdong, Paniagua-Domínguez, Ramón, Lai, Keng Heng, Lin, Qunying, Zheng, Yuanjin, Kuznetsov, Arseniy I.
Other Authors: School of Electrical and Electronic Engineering
Format: Article
Language:English
Published: 2022
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Online Access:https://hdl.handle.net/10356/160186
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Institution: Nanyang Technological University
Language: English
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Summary:Novel display technologies aim at providing the users with increasingly immersive experiences. In this regard, it is a long-sought dream to generate three-dimensional (3D) scenes with high resolution and continuous depth, which can be overlaid with the real world. Current attempts to do so, however, fail in providing either truly 3D information, or a large viewing area and angle, strongly limiting the user immersion. Here, we report a proof-of-concept solution for this problem, and realize a compact holographic 3D near-eye display with a large exit pupil of 10mm x 8.66mm. The 3D image is generated from a highly transparent Huygens metasurface hologram with large (>10^8) pixel count and subwavelength pixels, fabricated via deep-ultraviolet immersion photolithography on 300 mm glass wafers. We experimentally demonstrate high quality virtual 3D scenes with ~50k active data points and continuous depth ranging from 0.5m to 2m, overlaid with the real world and easily viewed by naked eye. To do so, we introduce a new design method for holographic near-eye displays that, inherently, is able to provide both parallax and accommodation cues, fundamentally solving the vergence-accommodation conflict that exists in current commercial 3D displays. Additionally, the complementary metal oxide semiconductor (CMOS) compatible, industry-grade fabrication technology employed opens new avenues for the large-scale, mass manufacturing of metasurfaces.