Adsorption and reaction mechanisms of direct palladium synthesis by ALD using Pd(hfac)₂ and ozone on Si (100) surface

Palladium nanoparticles made by atomic layer deposition (ALD) normally involve formaldehyde or H2 as a reducing agent. Since formaldehyde is toxic and H2 is explosive, it is advantageous to remove this reducing step during the fabrication of palladium metal by ALD. In this work we have successfully...

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Main Authors: Cheng, Chunyu, Zou, Yiming, Li, Jiahui, Ong, Amanda Jiamin, Goei, Ronn, Huang, Jingfeng, Li, Shuzhou, Tok, Alfred Iing Yoong
Other Authors: School of Materials Science and Engineering
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Language:English
Published: 2022
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Online Access:https://hdl.handle.net/10356/160884
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Institution: Nanyang Technological University
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spelling sg-ntu-dr.10356-1608842023-07-14T16:05:06Z Adsorption and reaction mechanisms of direct palladium synthesis by ALD using Pd(hfac)₂ and ozone on Si (100) surface Cheng, Chunyu Zou, Yiming Li, Jiahui Ong, Amanda Jiamin Goei, Ronn Huang, Jingfeng Li, Shuzhou Tok, Alfred Iing Yoong School of Materials Science and Engineering Engineering::Materials Palladium Ozone Palladium nanoparticles made by atomic layer deposition (ALD) normally involve formaldehyde or H2 as a reducing agent. Since formaldehyde is toxic and H2 is explosive, it is advantageous to remove this reducing step during the fabrication of palladium metal by ALD. In this work we have successfully used Pd(hfac)2 and ozone directly to prepare palladium nanoparticles, without the use of reducing or annealing agents. Density functional theory (DFT) was employed to explore the reaction mechanisms of palladium metal formation in this process. DFT results show that Pd(hfac)2 dissociatively chemisorbed to form Pd(hfac)* and hfac* on the Si (100) surface. Subsequently, an O atom of the ozone could cleave the C–C bond of Pd(hfac)* to form Pd* with a low activation barrier of 0.46 eV. An O atom of the ozone could also be inserted into the hfac* to form Pd(hfac-O)* with a lower activation barrier of 0.29 eV. With more ozone, the C–C bond of Pd(hfac-O)* could be broken to produce Pd* with an activation barrier of 0.42 eV. The ozone could also chemisorb on the Pd atom of Pd(hfac-O)* to form O3-Pd(hfac-O)*, which could separate into O-Pd(hfac-O)* with a high activation barrier of 0.83 eV. Besides, the activation barrier was 0.64 eV for Pd* that was directly oxidized to PdOx by ozone. Based on activation barriers from DFT calculations, it was possible to prepare palladium without reducing steps when ALD conditions were carefully controlled, especially the ozone parameters, as shown by our experimental results. The mechanisms of this approach could be used to prepare other noble metals by ALD without reducing/annealing agents. Agency for Science, Technology and Research (A*STAR) Published version This research was funded by the Agency for Science, Technology and Research (A*STAR) under award number SERC A1983c0032, AME Individual Research Grant (IRG)grant number. 2022-08-05T04:36:14Z 2022-08-05T04:36:14Z 2021 Journal Article Cheng, C., Zou, Y., Li, J., Ong, A. J., Goei, R., Huang, J., Li, S. & Tok, A. I. Y. (2021). Adsorption and reaction mechanisms of direct palladium synthesis by ALD using Pd(hfac)₂ and ozone on Si (100) surface. Processes, 9(12), 2246-. https://dx.doi.org/10.3390/pr9122246 2227-9717 https://hdl.handle.net/10356/160884 10.3390/pr9122246 2-s2.0-85121728698 12 9 2246 en SERC A1983c0032 Processes © 2021 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https:// creativecommons.org/licenses/by/ 4.0/). application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic Engineering::Materials
Palladium
Ozone
spellingShingle Engineering::Materials
Palladium
Ozone
Cheng, Chunyu
Zou, Yiming
Li, Jiahui
Ong, Amanda Jiamin
Goei, Ronn
Huang, Jingfeng
Li, Shuzhou
Tok, Alfred Iing Yoong
Adsorption and reaction mechanisms of direct palladium synthesis by ALD using Pd(hfac)₂ and ozone on Si (100) surface
description Palladium nanoparticles made by atomic layer deposition (ALD) normally involve formaldehyde or H2 as a reducing agent. Since formaldehyde is toxic and H2 is explosive, it is advantageous to remove this reducing step during the fabrication of palladium metal by ALD. In this work we have successfully used Pd(hfac)2 and ozone directly to prepare palladium nanoparticles, without the use of reducing or annealing agents. Density functional theory (DFT) was employed to explore the reaction mechanisms of palladium metal formation in this process. DFT results show that Pd(hfac)2 dissociatively chemisorbed to form Pd(hfac)* and hfac* on the Si (100) surface. Subsequently, an O atom of the ozone could cleave the C–C bond of Pd(hfac)* to form Pd* with a low activation barrier of 0.46 eV. An O atom of the ozone could also be inserted into the hfac* to form Pd(hfac-O)* with a lower activation barrier of 0.29 eV. With more ozone, the C–C bond of Pd(hfac-O)* could be broken to produce Pd* with an activation barrier of 0.42 eV. The ozone could also chemisorb on the Pd atom of Pd(hfac-O)* to form O3-Pd(hfac-O)*, which could separate into O-Pd(hfac-O)* with a high activation barrier of 0.83 eV. Besides, the activation barrier was 0.64 eV for Pd* that was directly oxidized to PdOx by ozone. Based on activation barriers from DFT calculations, it was possible to prepare palladium without reducing steps when ALD conditions were carefully controlled, especially the ozone parameters, as shown by our experimental results. The mechanisms of this approach could be used to prepare other noble metals by ALD without reducing/annealing agents.
author2 School of Materials Science and Engineering
author_facet School of Materials Science and Engineering
Cheng, Chunyu
Zou, Yiming
Li, Jiahui
Ong, Amanda Jiamin
Goei, Ronn
Huang, Jingfeng
Li, Shuzhou
Tok, Alfred Iing Yoong
format Article
author Cheng, Chunyu
Zou, Yiming
Li, Jiahui
Ong, Amanda Jiamin
Goei, Ronn
Huang, Jingfeng
Li, Shuzhou
Tok, Alfred Iing Yoong
author_sort Cheng, Chunyu
title Adsorption and reaction mechanisms of direct palladium synthesis by ALD using Pd(hfac)₂ and ozone on Si (100) surface
title_short Adsorption and reaction mechanisms of direct palladium synthesis by ALD using Pd(hfac)₂ and ozone on Si (100) surface
title_full Adsorption and reaction mechanisms of direct palladium synthesis by ALD using Pd(hfac)₂ and ozone on Si (100) surface
title_fullStr Adsorption and reaction mechanisms of direct palladium synthesis by ALD using Pd(hfac)₂ and ozone on Si (100) surface
title_full_unstemmed Adsorption and reaction mechanisms of direct palladium synthesis by ALD using Pd(hfac)₂ and ozone on Si (100) surface
title_sort adsorption and reaction mechanisms of direct palladium synthesis by ald using pd(hfac)₂ and ozone on si (100) surface
publishDate 2022
url https://hdl.handle.net/10356/160884
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