Simulation of optical reflectivity of single and multilayer coatings at 1064nm

• Main Author: Wong, Jason.
• Other Authors: Tay Beng Kang
• Format: Final Year Project
• Language: English
• Published: 2009
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
• Online Access: http://hdl.handle.net/10356/16784
• Institution: Nanyang Technological University

This report documents on the understanding, development and the analysis of the simulation of optical reflectivity of single and multilayer coatings at 1064nm. This project uses Essential Macleod software to simulate the reflectivity of single and multilayer thin films. High reflectance (HR) and anti-reflection (AR) coatings will be applied on various substrates such as Fused Silica and Yttrium Aluminum Garnet (YAG, Y3Al5O12) crystal. The coating materials of interest for HR and AR are Titanium, Titanium Oxide, Silicon and Silicon Oxide. The target is to achieve an optical reflection of >99.9% for HR coating and <0.2% for AR coating at 1064nm. The bandwidth of both AR and HR coatings should encompass +/-50nm from the target wavelength of 1064nm, i.e. 100nm bandwidth. The report begins with a description of its purpose, background, project objectives and scope of the project. Next, it provides theoretical background on the important knowledge for designing and understanding of optics especially for optical thin film. The main discussion deals with designing of HR and AR through a single layer and multilayer approach before refining and optimizing the design. Following by a detailed analysis of the actual fabricated product compared to the “ideal” results generated from the simulation. Analysis consists of UV spectrometer correlation and also aging effects of the optical thin film