Solventless 3D printed high-temperature resistant cyclosiloxane-containing resin for low-shrinkage ceramization and nano-functional composite development

Digital light processing (DLP) 3D printing technology has the advantage of rapid preparation of high-precision complex devices. However, photosensitive resin's insufficient high-temperature resistance and mechanical properties limit its application in aerospace and structural functional devices...

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Bibliographic Details
Main Authors: Zhou, Zihao, Zhou, Xinran, Yuan, Xueyu, Li, Bing, Song, Yujie, Liu, Ming
Other Authors: School of Materials Science and Engineering
Format: Article
Language:English
Published: 2023
Subjects:
Online Access:https://hdl.handle.net/10356/169421
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Institution: Nanyang Technological University
Language: English
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Summary:Digital light processing (DLP) 3D printing technology has the advantage of rapid preparation of high-precision complex devices. However, photosensitive resin's insufficient high-temperature resistance and mechanical properties limit its application in aerospace and structural functional devices. Herein, we propose a photosensitive cyclosiloxane-containing resins through thiol-ene click reaction. The UV cured cyclosiloxane-containing resins showed high-temperature resistance (5% weight loss ≈ 400 °C), tunable mechanical properties, low temperature derived ceramics etc. With photosensitive characteristics of the developed systems proven by the photo-rheology studies, printing parameters were calculated by Beer-Lambert's law to achieve precise control of the 3D printed constructs with complex geometries. This study also demonstrates the feasibility of ceramicization of the 3D printed parts and the incorporation of nano-functional materials (MXene, invisible ink) for functional device preparation.