Deposition and characterisation of a diamond/Ti/diamond multilayer structure

Deposition and characterisation of a diamond/Ti/diamond multilayer structure

In this work, a diamond/Ti/diamond multilayer structure has been fabricated by successively following thin-film CVD and PVD routes. It has been found that a combined pre-treatment of the silicon base substrate, via argon plasma etching for creating surface roughness and, thereafter, detonation nanod...

Full description

Saved in:
Bibliographic Details
Main Authors: Mallik, Awadesh Kumar, Lloret, Fernando, Gutierrez, Marina, Rouzbahani, Rozita, Pobedinskas, Paulius, Shih, Wen-Ching, Haenen, Ken
Other Authors: Temasek Laboratories @ NTU
Format: Article
Language:English
Published: 2024
Subjects:
Engineering
Diamond
Titanium
Online Access:https://hdl.handle.net/10356/173906
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Nanyang Technological University
Language: English

Internet

https://hdl.handle.net/10356/173906

Similar Items