Deposition and characterisation of a diamond/Ti/diamond multilayer structure
In this work, a diamond/Ti/diamond multilayer structure has been fabricated by successively following thin-film CVD and PVD routes. It has been found that a combined pre-treatment of the silicon base substrate, via argon plasma etching for creating surface roughness and, thereafter, detonation nanod...
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| Main Authors: | , , , , , , |
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| Other Authors: | |
| Format: | Article |
| Language: | English |
| Published: |
2024
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| Subjects: | |
| Online Access: | https://hdl.handle.net/10356/173906 |
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| Institution: | Nanyang Technological University |
| Language: | English |