Deposition and characterisation of a diamond/Ti/diamond multilayer structure

• المؤلفون الرئيسيون: Mallik, Awadesh Kumar, Lloret, Fernando, Gutierrez, Marina, Rouzbahani, Rozita, Pobedinskas, Paulius, Shih, Wen-Ching, Haenen, Ken
• مؤلفون آخرون: Temasek Laboratories @ NTU
• التنسيق: مقال
• اللغة: English
• منشور في: 2024
• الموضوعات: Engineering; Diamond; Titanium
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/173906

In this work, a diamond/Ti/diamond multilayer structure has been fabricated by successively following thin-film CVD and PVD routes. It has been found that a combined pre-treatment of the silicon base substrate, via argon plasma etching for creating surface roughness and, thereafter, detonation nanod...