Wafer-scale silicon microfabrication technology toward realization of low-cost sub-THz waveguide devices
This paper presents a wafer-scale silicon microfabrication technology for the sub-terahertz (sub-THz) waveguide device mass production. Based on the effective scheme, a WR-5 (140-220 GHz) straight rectangular waveguide and a WR-2.8 (260-400 GHz) rectangular waveguide bandpass filter are implemented...
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sg-ntu-dr.10356-1758392024-05-08T01:22:43Z Wafer-scale silicon microfabrication technology toward realization of low-cost sub-THz waveguide devices Zhao, Xinghai Wu, Peng Liu, Fei School of Electrical and Electronic Engineering Engineering Silicon micromachining Waveguide filter This paper presents a wafer-scale silicon microfabrication technology for the sub-terahertz (sub-THz) waveguide device mass production. Based on the effective scheme, a WR-5 (140-220 GHz) straight rectangular waveguide and a WR-2.8 (260-400 GHz) rectangular waveguide bandpass filter are implemented as demonstrated examples. The silicon deep reactive ion etching (DRIE) process is employed to etch through the total thickness of the silicon wafer and form the main waveguide channels. Then, a low-temperature thermal compression process is used to bond the trough-etched wafer with the top and bottom metallised silicon wafers to form the closed waveguide structures without any precise alignment process. The fabricated waveguide has the benefit of low transmission loss (0.03-0.05 dB mm−1) at the whole G band. Besides, to measure the fabricated WR-2.8 waveguide filter and solve the measuring equipment standard waveguide difference, silicon micromachined waveguide transitions are explored and fabricated to match two different frequency-band modules for measuring the waveguide filters in the desired full frequency band, which also has a potential application for the different size waveguide conversion. The measured results agree well with the simulated ones. The measured 3 dB bandwidth is 9.3%, with a central frequency of 343 GHz; the average insertion loss (IL) is about 1.6 dB in the pass band, including two extra straight waveguides of 8 mm length on input/output ends and two external waveguide-to-waveguide transitions. The proposed method provides a feasible and cost-effective solution for the mass production of high-performance waveguide devices and integrated systems in sub-THz frequency bands and beyond. Nanyang Technological University This work was supported in part by the Wallenberg-NTU Research Fellowship. 2024-05-08T01:22:43Z 2024-05-08T01:22:43Z 2024 Journal Article Zhao, X., Wu, P. & Liu, F. (2024). Wafer-scale silicon microfabrication technology toward realization of low-cost sub-THz waveguide devices. Journal of Micromechanics and Microengineering, 34(4), 045003-. https://dx.doi.org/10.1088/1361-6439/ad2aee 0960-1317 https://hdl.handle.net/10356/175839 10.1088/1361-6439/ad2aee 2-s2.0-85187196994 4 34 045003 en Journal of Micromechanics and Microengineering © 2024 IOP Publishing Ltd. All rights reserved. |
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Engineering Silicon micromachining Waveguide filter Zhao, Xinghai Wu, Peng Liu, Fei Wafer-scale silicon microfabrication technology toward realization of low-cost sub-THz waveguide devices |
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This paper presents a wafer-scale silicon microfabrication technology for the sub-terahertz (sub-THz) waveguide device mass production. Based on the effective scheme, a WR-5 (140-220 GHz) straight rectangular waveguide and a WR-2.8 (260-400 GHz) rectangular waveguide bandpass filter are implemented as demonstrated examples. The silicon deep reactive ion etching (DRIE) process is employed to etch through the total thickness of the silicon wafer and form the main waveguide channels. Then, a low-temperature thermal compression process is used to bond the trough-etched wafer with the top and bottom metallised silicon wafers to form the closed waveguide structures without any precise alignment process. The fabricated waveguide has the benefit of low transmission loss (0.03-0.05 dB mm−1) at the whole G band. Besides, to measure the fabricated WR-2.8 waveguide filter and solve the measuring equipment standard waveguide difference, silicon micromachined waveguide transitions are explored and fabricated to match two different frequency-band modules for measuring the waveguide filters in the desired full frequency band, which also has a potential application for the different size waveguide conversion. The measured results agree well with the simulated ones. The measured 3 dB bandwidth is 9.3%, with a central frequency of 343 GHz; the average insertion loss (IL) is about 1.6 dB in the pass band, including two extra straight waveguides of 8 mm length on input/output ends and two external waveguide-to-waveguide transitions. The proposed method provides a feasible and cost-effective solution for the mass production of high-performance waveguide devices and integrated systems in sub-THz frequency bands and beyond. |
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School of Electrical and Electronic Engineering |
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School of Electrical and Electronic Engineering Zhao, Xinghai Wu, Peng Liu, Fei |
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Article |
author |
Zhao, Xinghai Wu, Peng Liu, Fei |
author_sort |
Zhao, Xinghai |
title |
Wafer-scale silicon microfabrication technology toward realization of low-cost sub-THz waveguide devices |
title_short |
Wafer-scale silicon microfabrication technology toward realization of low-cost sub-THz waveguide devices |
title_full |
Wafer-scale silicon microfabrication technology toward realization of low-cost sub-THz waveguide devices |
title_fullStr |
Wafer-scale silicon microfabrication technology toward realization of low-cost sub-THz waveguide devices |
title_full_unstemmed |
Wafer-scale silicon microfabrication technology toward realization of low-cost sub-THz waveguide devices |
title_sort |
wafer-scale silicon microfabrication technology toward realization of low-cost sub-thz waveguide devices |
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2024 |
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https://hdl.handle.net/10356/175839 |
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1806059860367769600 |