Programmable ferroelectricity in Hf0.5Zr0.5O2 enabled by oxygen defect engineering

Ferroelectricity, especially the Si-compatible type recently observed in hafnia-based materials, is technologically useful for modern memory and logic applications, but it is challenging to differentiate intrinsic ferroelectric polarization from the polar phase and oxygen vacancy. Here, we report el...

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Main Authors: Shao, Minghao, Liu, Houfang, He, Ri, Li, Xiaomei, Wu, Liang, Ma, Ji, Ye, Chen, Hu, Xiangchen, Zhao, Ruiting, Zhong, Zhicheng, Yu, Yi, Wan, Caihua, Yang, Yi, Nan, Ce-Wen, Bai, Xuedong, Ren, Tian-Ling, Wang, Renshaw Xiao
其他作者: School of Electrical and Electronic Engineering
格式: Article
語言:English
出版: 2024
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在線閱讀:https://hdl.handle.net/10356/178205
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