Computer control on deposition process in thin film transistor fabrication

• Main Author: Koh, Michelle Shi Hui.
• Other Authors: Mei Ting
• Format: Final Year Project
• Language: English
• Published: 2009
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Control and instrumentation::Control engineering
• Online Access: http://hdl.handle.net/10356/17825
• Institution: Nanyang Technological University

Organic thin film transistors (OTFTs) have lived to see great improvements in the recent years. They prove to be competitive with existing or novel thin film transistor applications requiring large-area coverage, structural flexibility, low temperature processing and, especially low cost. Pentacene has been the most attractive material for OTFTs because of its high mobility and it is comparable to amorphous silicon thin film transistor. Physical Vapour Deposition (PVD) is a technique used to deposit thin film organic materials. In this report, a user interface will be implemented to control the operating temperature of the PVD system. This interface will allow the user to effectively monitor the temperature status in the deposition chamber. At the same time, PVD experiments will be carried out to deposit a thin layer of Pentacene at different temperatures. Various characterization of the pentacene layer will be carried out to investigate its optical properties such as photoluminescence and refractive index.