High-uniformity, shape-controlled silicon nanowires for enhanced performance in optoelectronic devices

• Main Authors: Zhao, Zhi-Jun, Shin, Sang-Ho, Xu, Xianwu, Kim, You Jin, Yang, Zu-Po, Hwang, Soonhyoung, Jeon, Sohee, Yu, Bingjun, Qian, Linmao, Ju, Byeong-Kwon, Jeong, Jun-Ho, Kim, Munho
• 其他作者: School of Electrical and Electronic Engineering
• 格式: Article
• 語言: English
• 出版: 2025
• 主題: Engineering; High-uniformity; Metal-assisted chemical etching
• 在線閱讀: https://hdl.handle.net/10356/183392
• 機構: Nanyang Technological University

Silicon nanowires (Si NWs) have attracted considerable interest owing to their distinctive properties, which render them promising candidates for a wide range of advanced applications in electronics, photonics, energy storage, and sensing. However, challenges in achieving large-scale production, hig...