Characterization of sputtered, doped BaTiO3 films for multiferroic applications
In this study, single phase Co-doped BaTiO3 (BTO) thin films were fabricated by magnetron sputtering on three different substrates namely, SiO2/Si, Pt/Ti/SiO2/Si and LaxSr1-xMnO3 (LSMO). The effects of sputtering parameters such as rf power, deposition pressure, oxygen content in the environment on...
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sg-ntu-dr.10356-187172023-03-04T16:31:58Z Characterization of sputtered, doped BaTiO3 films for multiferroic applications Haghighi, Sara Borhani Thirumany Sritharan School of Materials Science & Engineering DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films In this study, single phase Co-doped BaTiO3 (BTO) thin films were fabricated by magnetron sputtering on three different substrates namely, SiO2/Si, Pt/Ti/SiO2/Si and LaxSr1-xMnO3 (LSMO). The effects of sputtering parameters such as rf power, deposition pressure, oxygen content in the environment on the structure and chemistry of the films were evaluated. X-ray diffraction was used as the main characterization technique along with Rietveld refinement to obtain detailed structural and chemical information. The relationship between the film structure and sputtering parameters is the main theme of this report, but surface topography and limited ferroelectric and magnetic properties were also determined. Master of Engineering 2009-07-06T01:58:05Z 2009-07-06T01:58:05Z 2009 2009 Thesis http://hdl.handle.net/10356/18717 en 140 p. application/pdf |
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DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films Haghighi, Sara Borhani Characterization of sputtered, doped BaTiO3 films for multiferroic applications |
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In this study, single phase Co-doped BaTiO3 (BTO) thin films were fabricated by magnetron sputtering on three different substrates namely, SiO2/Si, Pt/Ti/SiO2/Si and LaxSr1-xMnO3 (LSMO). The effects of sputtering parameters such as rf power, deposition pressure, oxygen content in the environment on the structure and chemistry of the films were evaluated. X-ray diffraction was used as the main characterization technique along with Rietveld refinement to obtain detailed structural and chemical information. The relationship between the film structure and sputtering parameters is the main theme of this report, but surface topography and limited ferroelectric and magnetic properties were also determined. |
author2 |
Thirumany Sritharan |
author_facet |
Thirumany Sritharan Haghighi, Sara Borhani |
format |
Theses and Dissertations |
author |
Haghighi, Sara Borhani |
author_sort |
Haghighi, Sara Borhani |
title |
Characterization of sputtered, doped BaTiO3 films for multiferroic applications |
title_short |
Characterization of sputtered, doped BaTiO3 films for multiferroic applications |
title_full |
Characterization of sputtered, doped BaTiO3 films for multiferroic applications |
title_fullStr |
Characterization of sputtered, doped BaTiO3 films for multiferroic applications |
title_full_unstemmed |
Characterization of sputtered, doped BaTiO3 films for multiferroic applications |
title_sort |
characterization of sputtered, doped batio3 films for multiferroic applications |
publishDate |
2009 |
url |
http://hdl.handle.net/10356/18717 |
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1759857628967600128 |