Effect of lens aberrations and illumination imperfections in low k1 lithography of DRAMs

This thesis presents how printing performance at llOnm technology node with KrF (248nm) lithography can be impaired if scanner lens aberrations are not contained within optimal levels. Lens aberrations drift over a period of time and need continuous monitoring and tuning to ensure stable Scanner cha...

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Main Author:	Ranjan Khurana
Other Authors:	School of Electrical and Electronic Engineering
Format:	Theses and Dissertations
Published:	2008
Subjects:	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits
Online Access:	http://hdl.handle.net/10356/3176
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Institution:	Nanyang Technological University

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spelling	sg-ntu-dr.10356-31762023-07-04T16:40:12Z Effect of lens aberrations and illumination imperfections in low k1 lithography of DRAMs Ranjan Khurana School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Microelectronics DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits This thesis presents how printing performance at llOnm technology node with KrF (248nm) lithography can be impaired if scanner lens aberrations are not contained within optimal levels. Lens aberrations drift over a period of time and need continuous monitoring and tuning to ensure stable Scanner characteristics. Second portion of the dissertation proposes a new method of illumination sigma matching for tools from different vendors which have different optical elements. Master of Science (Microelectronics) 2008-09-17T09:24:01Z 2008-09-17T09:24:01Z 2006 2006 Thesis http://hdl.handle.net/10356/3176 Nanyang Technological University application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
topic	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits
spellingShingle	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits Ranjan Khurana Effect of lens aberrations and illumination imperfections in low k1 lithography of DRAMs
description	This thesis presents how printing performance at llOnm technology node with KrF (248nm) lithography can be impaired if scanner lens aberrations are not contained within optimal levels. Lens aberrations drift over a period of time and need continuous monitoring and tuning to ensure stable Scanner characteristics. Second portion of the dissertation proposes a new method of illumination sigma matching for tools from different vendors which have different optical elements.
author2	School of Electrical and Electronic Engineering
author_facet	School of Electrical and Electronic Engineering Ranjan Khurana
format	Theses and Dissertations
author	Ranjan Khurana
author_sort	Ranjan Khurana
title	Effect of lens aberrations and illumination imperfections in low k1 lithography of DRAMs
title_short	Effect of lens aberrations and illumination imperfections in low k1 lithography of DRAMs
title_full	Effect of lens aberrations and illumination imperfections in low k1 lithography of DRAMs
title_fullStr	Effect of lens aberrations and illumination imperfections in low k1 lithography of DRAMs
title_full_unstemmed	Effect of lens aberrations and illumination imperfections in low k1 lithography of DRAMs
title_sort	effect of lens aberrations and illumination imperfections in low k1 lithography of drams
publishDate	2008
url	http://hdl.handle.net/10356/3176
_version_	1772825591040442368

Effect of lens aberrations and illumination imperfections in low k1 lithography of DRAMs

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