Low dimensional semiconductor structures MOCVD growth and their characterizations

This project is on low dimensional semiconductor structures MOCVD growth and their characterizations, mainly focused on multiple quantum wells structure growth by MOCVD. Samples were characterized by using high resolution X-ray diffractions (XRD) and photoluminescence (PL). In this dissertation, pro...

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Main Author: Song, Yi Fei.
Other Authors: Tang, Xiaohong
Format: Theses and Dissertations
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/10356/3278
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Institution: Nanyang Technological University
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spelling sg-ntu-dr.10356-32782023-07-04T15:52:31Z Low dimensional semiconductor structures MOCVD growth and their characterizations Song, Yi Fei. Tang, Xiaohong School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Semiconductors This project is on low dimensional semiconductor structures MOCVD growth and their characterizations, mainly focused on multiple quantum wells structure growth by MOCVD. Samples were characterized by using high resolution X-ray diffractions (XRD) and photoluminescence (PL). In this dissertation, properties of low dimensional semiconductor quantum well structures have been discussed. The principle of MOCVD growth in terms of its growth process, mechanism, the starting precursors and growth system has been described. Experiment setup and the application of XRD and PL used in this project have been introduced. Master of Science (Photonics) 2008-09-17T09:26:15Z 2008-09-17T09:26:15Z 2005 2005 Thesis http://hdl.handle.net/10356/3278 Nanyang Technological University application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
topic DRNTU::Engineering::Electrical and electronic engineering::Semiconductors
spellingShingle DRNTU::Engineering::Electrical and electronic engineering::Semiconductors
Song, Yi Fei.
Low dimensional semiconductor structures MOCVD growth and their characterizations
description This project is on low dimensional semiconductor structures MOCVD growth and their characterizations, mainly focused on multiple quantum wells structure growth by MOCVD. Samples were characterized by using high resolution X-ray diffractions (XRD) and photoluminescence (PL). In this dissertation, properties of low dimensional semiconductor quantum well structures have been discussed. The principle of MOCVD growth in terms of its growth process, mechanism, the starting precursors and growth system has been described. Experiment setup and the application of XRD and PL used in this project have been introduced.
author2 Tang, Xiaohong
author_facet Tang, Xiaohong
Song, Yi Fei.
format Theses and Dissertations
author Song, Yi Fei.
author_sort Song, Yi Fei.
title Low dimensional semiconductor structures MOCVD growth and their characterizations
title_short Low dimensional semiconductor structures MOCVD growth and their characterizations
title_full Low dimensional semiconductor structures MOCVD growth and their characterizations
title_fullStr Low dimensional semiconductor structures MOCVD growth and their characterizations
title_full_unstemmed Low dimensional semiconductor structures MOCVD growth and their characterizations
title_sort low dimensional semiconductor structures mocvd growth and their characterizations
publishDate 2008
url http://hdl.handle.net/10356/3278
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