Strain relaxation in SiGe/Si heteroepitaxy
163 p.
Saved in:
Main Author: | |
---|---|
Other Authors: | |
Format: | Theses and Dissertations |
Published: |
2010
|
Subjects: | |
Online Access: | https://hdl.handle.net/10356/35953 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Nanyang Technological University |
id |
sg-ntu-dr.10356-35953 |
---|---|
record_format |
dspace |
spelling |
sg-ntu-dr.10356-359532023-03-04T16:47:45Z Strain relaxation in SiGe/Si heteroepitaxy Wong, Lydia Helena Wong Chee Cheong School of Materials Science & Engineering DRNTU::Engineering::Materials::Photonics and optoelectronics materials 163 p. Heteroepitaxy of lattice-mismatched materials are important for both optoelectronic and microelectronic applications. Within the community of research in heteroepitaxy, the long-standing goal is to obtain strain relaxation while minimizing the generation of defects which often leads to device degradation. DOCTOR OF PHILOSOPHY (MSE) 2010-04-23T02:14:38Z 2010-04-23T02:14:38Z 2007 2007 Thesis Wong, L. H. (2007). Strain relaxation in SiGe/Si heteroepitaxy. Doctoral thesis, Nanyang Technological University, Singapore. https://hdl.handle.net/10356/35953 10.32657/10356/35953 application/pdf |
institution |
Nanyang Technological University |
building |
NTU Library |
continent |
Asia |
country |
Singapore Singapore |
content_provider |
NTU Library |
collection |
DR-NTU |
topic |
DRNTU::Engineering::Materials::Photonics and optoelectronics materials |
spellingShingle |
DRNTU::Engineering::Materials::Photonics and optoelectronics materials Wong, Lydia Helena Strain relaxation in SiGe/Si heteroepitaxy |
description |
163 p. |
author2 |
Wong Chee Cheong |
author_facet |
Wong Chee Cheong Wong, Lydia Helena |
format |
Theses and Dissertations |
author |
Wong, Lydia Helena |
author_sort |
Wong, Lydia Helena |
title |
Strain relaxation in SiGe/Si heteroepitaxy |
title_short |
Strain relaxation in SiGe/Si heteroepitaxy |
title_full |
Strain relaxation in SiGe/Si heteroepitaxy |
title_fullStr |
Strain relaxation in SiGe/Si heteroepitaxy |
title_full_unstemmed |
Strain relaxation in SiGe/Si heteroepitaxy |
title_sort |
strain relaxation in sige/si heteroepitaxy |
publishDate |
2010 |
url |
https://hdl.handle.net/10356/35953 |
_version_ |
1759858141275619328 |