A total concentration fixed-grid method for wet chemical etching process

177 p.

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主要作者: Prasenjit Rath
其他作者: Chai Chee Kiong, John
格式: Theses and Dissertations
出版: 2010
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在線閱讀:https://hdl.handle.net/10356/36008
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spelling sg-ntu-dr.10356-360082023-03-11T17:46:41Z A total concentration fixed-grid method for wet chemical etching process Prasenjit Rath Chai Chee Kiong, John Zheng Hong Yu School of Mechanical and Aerospace Engineering DRNTU::Engineering::Manufacturing 177 p. Chemical Etching (CE) is an important production process for the fabrication of electronic devices. CE process is widely applicable in the manufacturing of integrated circuit (IC) devices, micro-electro-mechanical-system (MEMS) devices, production of shadow mask for color TV etc. Wet chemical etching (WCE) is widely used CE process due to its low cost, high etch rate and good selectivity compared to other existing CE processes. WCE process involves dissolution of substrate by chemical reaction with liquid chemicals called as etchant. The substrate to be etched is partly protected by photoresist mask to protect it from direct contact with the etchant. The mask forms the desired pattern over the substrate surface. During the process of etching, the etched interface moves because of the dissolution of substrate by the etchant. Hence, this process is regarded as a moving boundary problem. Because of the presence of mask, the etched interface takes a very complicated shape in multidimensional etching. Predicting and understanding the etching profile growth is therefore very useful in designing the pattern structure used in fabricating IC and MEMS devices. The presence of moving boundary makes the problem highly non-linear. DOCTOR OF PHILOSOPHY (MAE) 2010-04-23T02:23:12Z 2010-04-23T02:23:12Z 2007 2007 Thesis Prasenjit Rath. (2007). A total concentration fixed-grid method for wet chemical etching process. Doctoral thesis, Nanyang Technological University, Singapore. https://hdl.handle.net/10356/36008 10.32657/10356/36008 application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
topic DRNTU::Engineering::Manufacturing
spellingShingle DRNTU::Engineering::Manufacturing
Prasenjit Rath
A total concentration fixed-grid method for wet chemical etching process
description 177 p.
author2 Chai Chee Kiong, John
author_facet Chai Chee Kiong, John
Prasenjit Rath
format Theses and Dissertations
author Prasenjit Rath
author_sort Prasenjit Rath
title A total concentration fixed-grid method for wet chemical etching process
title_short A total concentration fixed-grid method for wet chemical etching process
title_full A total concentration fixed-grid method for wet chemical etching process
title_fullStr A total concentration fixed-grid method for wet chemical etching process
title_full_unstemmed A total concentration fixed-grid method for wet chemical etching process
title_sort total concentration fixed-grid method for wet chemical etching process
publishDate 2010
url https://hdl.handle.net/10356/36008
_version_ 1761781737860366336