Investigating high-k on thin film

• Main Author: Kee, Pei Ling.
• Other Authors: Su Haibin
• Format: Final Year Project
• Language: English
• Published: 2010
• Subjects: DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
• Online Access: http://hdl.handle.net/10356/38595
• Institution: Nanyang Technological University

With the introduction of new materials, to overcome challenges in miniaturization, the silicon process technology works towards further scaling intensively. The research seeks to identify a gate dielectric material in replacement for silicon dioxide (SiO2) and to demonstrate reduced leakage current...