Raman investigation of nitride and oxide films

• Main Author: Tan, Bennie Wei Zhong.
• Other Authors: Sun Changqing
• Format: Final Year Project
• Language: English
• Published: 2010
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
• Online Access: http://hdl.handle.net/10356/40873
• Institution: Nanyang Technological University

Nanotechnology has been intensively studied on for creating many new materials and devices with a comprehensive range of applications, which consist of fields in medicine, electronics and energy production. Both oxides and nitrides have now become essentially important to most of the consumer products. Therefore, properties of oxides and nitrides are the area of interest. Characterization and determination of the metal oxides are done according to the bulk electronic and geometric properties which affect the surface properties of the metal oxides. While the properties of nitrides such as optical and structural make useful means for many applications by the nature of the chemical bond. Raman spectroscopy is used extensively for investigation of a material using means of visible light, near infrared or near ultraviolet source to attain information about the vibronic behaviour of the material. Raman scattering is the result of excitation of the material. Hence, two different forms of Raman transitions are created: stokes radiation and anti-Stokes radiation which also known as Red Shift scattered light and Blue Shift scattered light. In this report, it will comprise of the theoretical and practical analysis aspect to understand the vibration of the samples. It will be carried out with the help of the visible Raman spectroscopy that will determine the vibration excitation of the material in terms of the peak intensity. Thus combining both theoretical and practical approaches, the relationship between the Raman frequency shifting and size dependency of the material sample can therefore be determined.