Development of highly photosensitive low loss inorganic sol-gel films for direct ultraviolet-imprinting of planar waveguides

Highly photosensitive sol-gel derived inorganic 0.2GeO2:0.8SiO2 (germanosilicate) films have been developed to simplify the fabrication of photonic devices using a single step direct UV-imprinting (DUI) technique. The KrF excimer laser (248 nm) light induced refractive index change (?n) of germanosi...

全面介紹

Saved in:
書目詳細資料
主要作者: Rajni
其他作者: Kantisara Pita
格式: Theses and Dissertations
出版: 2008
主題:
在線閱讀:https://hdl.handle.net/10356/4113
標簽: 添加標簽
沒有標簽, 成為第一個標記此記錄!
機構: Nanyang Technological University