Development of highly photosensitive low loss inorganic sol-gel films for direct ultraviolet-imprinting of planar waveguides
Highly photosensitive sol-gel derived inorganic 0.2GeO2:0.8SiO2 (germanosilicate) films have been developed to simplify the fabrication of photonic devices using a single step direct UV-imprinting (DUI) technique. The KrF excimer laser (248 nm) light induced refractive index change (?n) of germanosi...
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格式: | Theses and Dissertations |
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2008
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在線閱讀: | https://hdl.handle.net/10356/4113 |
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機構: | Nanyang Technological University |