Development of highly photosensitive low loss inorganic sol-gel films for direct ultraviolet-imprinting of planar waveguides

Highly photosensitive sol-gel derived inorganic 0.2GeO2:0.8SiO2 (germanosilicate) films have been developed to simplify the fabrication of photonic devices using a single step direct UV-imprinting (DUI) technique. The KrF excimer laser (248 nm) light induced refractive index change (?n) of germanosi...

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Bibliographic Details
Main Author: Rajni
Other Authors: Kantisara Pita
Format: Theses and Dissertations
Published: 2008
Subjects:
Online Access:https://hdl.handle.net/10356/4113
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Institution: Nanyang Technological University

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