Preparation and characterization of amorphous SiCN films
In this project, a DC magnetron sputtering system with RF bias and a plasma enhanced electron cyclotron resonance chemical vapor deposition techniques have been successfully used to deposit a-SiCN films.
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2008
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sg-ntu-dr.10356-42772023-07-04T15:20:33Z Preparation and characterization of amorphous SiCN films Gao, Ying. Zhang, Dao Hua School of Electrical and Electronic Engineering Wei, Jun DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials In this project, a DC magnetron sputtering system with RF bias and a plasma enhanced electron cyclotron resonance chemical vapor deposition techniques have been successfully used to deposit a-SiCN films. Master of Engineering 2008-09-17T09:48:11Z 2008-09-17T09:48:11Z 2001 2001 Thesis http://hdl.handle.net/10356/4277 Nanyang Technological University application/pdf |
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DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials Gao, Ying. Preparation and characterization of amorphous SiCN films |
description |
In this project, a DC magnetron sputtering system with RF bias and a plasma enhanced electron cyclotron resonance chemical vapor deposition techniques have been successfully used to deposit a-SiCN films. |
author2 |
Zhang, Dao Hua |
author_facet |
Zhang, Dao Hua Gao, Ying. |
format |
Theses and Dissertations |
author |
Gao, Ying. |
author_sort |
Gao, Ying. |
title |
Preparation and characterization of amorphous SiCN films |
title_short |
Preparation and characterization of amorphous SiCN films |
title_full |
Preparation and characterization of amorphous SiCN films |
title_fullStr |
Preparation and characterization of amorphous SiCN films |
title_full_unstemmed |
Preparation and characterization of amorphous SiCN films |
title_sort |
preparation and characterization of amorphous sicn films |
publishDate |
2008 |
url |
http://hdl.handle.net/10356/4277 |
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1772827037802692608 |