Study on electron transport in ta-C film and the photo response of ta-C based hetero-junction
The Filtered Cathodic Vacuum Arc (FCVA) technique has been extensively studied for application on thin film deposition processes for many years. However some problems associated with the process control still exist. One typical contradiction in FCVA system is that on the one hand a high arc spot vel...
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| Format: | Theses and Dissertations |
| Published: |
2008
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| Online Access: | http://hdl.handle.net/10356/4419 |
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| Institution: | Nanyang Technological University |
| Summary: | The Filtered Cathodic Vacuum Arc (FCVA) technique has been extensively studied for application on thin film deposition processes for many years. However some problems associated with the process control still exist. One typical contradiction in FCVA system is that on the one hand a high arc spot velocity driven by magnetic the field is necessary to suppress the macroparticle emission and grooving effect. On the other hand a lower spot velocity can lead to a better control of arc spot location with less probability of arc extinction. In this project, the non-uniform contact resistance between the target and target holder (cathode) has been revealed as an additional factor causing grooving in the magnetic steering mode of a FCVA system. The new target structure that can change the arc spot distribution statistically in the steering mode is proposed. The experiments have been carried out and significant improvement observed. A computer model has been established successfully for the conventional equivalent circuit of a photovoltaic device. |
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