Plasma soft X-ray source for microelectronic lithography
266 p.
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| Format: | Theses and Dissertations |
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2011
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| Online Access: | http://hdl.handle.net/10356/47512 |
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| Institution: | Nanyang Technological University |
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sg-ntu-dr.10356-475122023-02-28T23:52:58Z Plasma soft X-ray source for microelectronic lithography Zhang, Gui Xin Lee Sing School of Physical and Mathematical Sciences Feng Xianping DRNTU::Science 266 p. Two different compact Plasma Focus (PF) devices — NNSX1 and NNSX2 were set up and developed as plasma soft x-ray sources for microelectronic lithography. This thesis reports investigation of soft x-ray emission from the plasma focus. Experiments were carried out under various experimental conditions, such as different configurations of PF chambers, different anode lengths, different initial neon pressures, different charging voltages, different polarities of central electrode as well as different repetition rates. Doctor of Philosophy (SPMS) 2011-12-27T08:31:44Z 2011-12-27T08:31:44Z 2011 Thesis http://hdl.handle.net/10356/47512 Nanyang Technological University application/pdf |
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Singapore Singapore |
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DRNTU::Science Zhang, Gui Xin Plasma soft X-ray source for microelectronic lithography |
| description |
266 p. |
| author2 |
Lee Sing |
| author_facet |
Lee Sing Zhang, Gui Xin |
| format |
Theses and Dissertations |
| author |
Zhang, Gui Xin |
| author_sort |
Zhang, Gui Xin |
| title |
Plasma soft X-ray source for microelectronic lithography |
| title_short |
Plasma soft X-ray source for microelectronic lithography |
| title_full |
Plasma soft X-ray source for microelectronic lithography |
| title_fullStr |
Plasma soft X-ray source for microelectronic lithography |
| title_full_unstemmed |
Plasma soft X-ray source for microelectronic lithography |
| title_sort |
plasma soft x-ray source for microelectronic lithography |
| publishDate |
2011 |
| url |
http://hdl.handle.net/10356/47512 |
| _version_ |
1759856972295831552 |