Demonstration lithography using plasma focus soft x-ray source
To demonstrate the soft x-ray source(SXR) developed and to gain experience in handling SXR masks and resists.
Saved in:
Main Authors: | , , , , , , , , , |
---|---|
其他作者: | |
格式: | Research Report |
出版: |
2008
|
主題: | |
在線閱讀: | http://hdl.handle.net/10356/3044 |
標簽: |
添加標簽
沒有標簽, 成為第一個標記此記錄!
|
機構: | Nanyang Technological University |