Demonstration lithography using plasma focus soft x-ray source

To demonstrate the soft x-ray source(SXR) developed and to gain experience in handling SXR masks and resists.

Saved in:
書目詳細資料
Main Authors: Lee, Sing, Wong, Terence Kin Shun, Feng, Xianping, Lee, Paul Choon Keat, Springham, Stuart V., Serban, Adrian, Liu, Mahe, Kudryashov, Vladimir, Gribkov, Vladimir A., Rajdeep Singh Rawat
其他作者: School of Electrical and Electronic Engineering
格式: Research Report
出版: 2008
主題:
在線閱讀:http://hdl.handle.net/10356/3044
標簽: 添加標簽
沒有標簽, 成為第一個標記此記錄!
機構: Nanyang Technological University